X'Pert³ MRD
다목적 연구 및 개발 XRD 시스템
- 측정
-
Epitaxy analysis
Interface roughness
Phase identification
Phase quantification
Reciprocal space analysis
Residual stress
Texture analysis
Thin film metrology
- Wafer mapping
- 100 mm
- C-to-C wafer loader
- No
- Goniometer configuration
- Horizontal goniometer, Θ-2Θ
- Minimum step size
- 0.0001º
- 기술 유형
-
X-ray Diffraction (XRD)