X'Pert³ is now a Smart Instrument!. Find out more
Find out more
The long and successful history of Malvern Panalytical's Materials Research Diffractometers (MRD) continues with the generation of X’Pert³ MRD XL. The improved performance and reliability of the new platform have added more analytical capability and power for X-ray scattering studies in:
The X’Pert³ MRD XL handles wide range of applications with full wafer mapping up to 200 mm.
Download brochureThe X'Pert³ MRD systems offer advanced and innovative X-ray diffraction solutions from research to process development and process control. The used technologies make all systems field upgradable to all existing options and new developments in hardware and software to come.
The X'Pert³ Extended MRD (XL) brings increased versatility to the range of X'Pert³ MRD systems. An extra PreFIX mounting platform allows mounting of an X-ray mirror and a high-resolution monochromator in-line, increasing significantly the intensity of the incident beam.
One can benefit from increased application versatility without compromise on data quality, high-resolution X-ray diffraction with high intensities, shorter measurement times for measurements such as reciprocal space mapping and rebuild from standard to extended configuration in minutes thanks to the PreFIX concept. With the 2nd generation PreFIX, reconfiguring is easy and optics positioning is more accurate than ever.
With the X'Pert³ MRD (XL) system for in-plane diffraction, it becomes possible to measure diffraction from lattice planes that are perpendicular to the sample surface.
Standard and in-plane geometries on one system and a wide range of diffraction experiments on polycrystalline and highly perfect thin films, are just two of many benefits.
Download the brochure: Semiconductor wafers - Crystalline quality
Unleash the potential of your data
Until now, instrument data has too often been stuck in manual records, spreadsheets or site-specific servers. By connecting the X'Pert3 MRD XL to our Smart Manager and continually analyzing instrument data in the cloud, you can unleash its full potential. This is just one of our digital solutions that are part of Malvern Panalytical's Smart Manager.
| Enclosure | |
|---|---|
| Dimensions | 1370 (w) x 1131 (d) x 1972 (h) mm
System is on wheels for easy installation and relocation |
| Weight | 1150 kg |
| Regulations | Meets all relevant worldwide regulations for electrical, mechanical and X-ray safety, with all anode types |
| Goniometer | |
| Type | Horizontal goniometer |
| Radius | 420 mm |
| Maximum usable range | -40°< 2θ <160° (depending on accessories) |
| Encoders | Direct optical encoding system for lifetime goniometer accuracy, using precisely aligned Heidenhain encoders |
| Long range accuracy | ±0.0025° |
| Short range (0.5°) accuracy | ±0.0004° |
| Angular reproducibility | < 0.0002° |
| X-ray source/ Detectors/ Stages | |
| Notes |
|
| Chi rotation | ±92° |
| Phi rotation | 2 x 360° |
| Smallest increment | 0.0001° |
The PIXcel3D is a unique 2D solid-state hybrid pixel detector. Each pixel is 55 microns x 55 microns and the detector array is 256 x 256 pixels. The detector, now based on Medipix3 technology, brings unrivalled signal to noise with its point spread function of one pixel and multiple energy discrimination levels.
The X’Pert3 MRD XL Cleanroom Package comprises smart solutions, including a fan filter unit, for the MRD XL that can be retrofitted to your existing instrument or supplied with a new one.
By filtering the air around your semiconductor wafer sample, the MRD XL Cleanroom Package helps you avoid contamination when analyzing them. In turn, this enables you to measure in a wider range of environments without having to invest in a new instrument.
As an additional software solution for our X’Pert3 MRD XL tool, automation can be integrated into your existing instrument to provide SECS/GEM compliant host control.
With these new capabilities, the MRD XL system can now play out its modularity and flexibility in a host controlled fab environment. This enables ensuring a contamination-free research or production environment.
The Malvern Panalytical X’Pert³ MRD and MRD XL are all-in-one X-ray solution systems that can be used in many industry applications, including:
Semiconductors and single crystal wafers
Whether for growth studies or device design, the measurement of layer quality, thickness, strain and alloy composition using high-resolution XRD has been at the heart of research and development in electronic and optoelectronic multilayer semiconductor devices. With a choice of X-ray mirrors, monochromators and detectors, the X’Pert3 MRD and MRD XL offer high-resolution configurations to suit different materials systems ranging from lattice matched semiconductors, through relaxed buffer layers on to novel exotic layers on non-standard substrates
Polycrystalline solids and thin films
Polycrystalline layers and coatings are an important component of many thin films and multilayer devices. The evolution of polycrystalline layer morphology during deposition is a key study area in functional materials research and development. X’Pert3 MRD and X’Pert3 MRD XL can be fully equipped with a range of slits, parallel beam X-ray mirror, polycapillary lens, crossed slits and monocapillaries to give the full choice of incident beam optics for reflectometry, stress, texture and phase ID.
Ultra-thin films, nanomaterials and amorphous layers
Functional devices may contain disordered, amorphous or nanocomposite thin films. The flexibility of the X’Pert3 MRD and MRD XL systems allow for the incorporation of multiple analytical methods. A range of high-resolution optics, slits and parallel plate collimators are available to give the optimum performance for grazing incidence methods, in-plane diffraction and reflectometry.
Measurement under non-ambient conditions
Studying the behavior of materials under a variety of conditions is an essential part of materials research and process development. The X’Pert3 MRD and MRD XL are designed for the easy incorporation of the DHS1100 non-ambient sample stage from Anton Paar, enabling automated measurementsunder a range of temperatures and inert atmosphere
Versatile XRD research & development. High intensities for shorter measurement times. A new generation of tools for your wafer analysis.
