Thin film metrology

X-ray thin film analysis

X-ray metrology is the ideal tool for thin film analysis in the development and mass production of different kind of layer-structured micro- and optoelectronic devices. 

X-ray metrology techniques have kept up with the progress in the industry through the development of new layer-based applications and technologies. 

They continue to serve as essential tools from the R&D phase through pilot production to full-scale automated manufacturing of semiconductor devices.

Thin film analysis solutions

Measurement tools based on X-ray methods, such as XRD, XRR and XRF, have proven to provide rapid, non-destructive, reliable and accurate access to critical thin film parameters ranging from ultra-thin single layers to complex multilayer stacks.

Find out more about our thin film analysis instruments below.

Zetium

Zetium

Smart Zetium for reliable results and robust operation

Axios FAST

Axios FAST

XRF of choice for highest throughput or shortest measurement time

2830 ZT

2830 ZT

Advanced semiconductor thin film metrology solution

Epsilon 4

Epsilon 4

Fast and accurate at-line elemental analysis

X'Pert³ MRD

X'Pert³ MRD

Versatile research & development XRD system

X'Pert³ MRD XL

X'Pert³ MRD XL

Versatile research, development & quality control XRD system

Measurement type
Thin film metrology
Technology
Wavelength Dispersive X-ray Fluorescence (WDXRF)
X-ray Diffraction (XRD)
Energy Dispersive X-ray Fluorescence (EDXRF)