X'Pert³ MRD
Versátil sistema XRD de pesquisa e desenvolvimento
- Medição
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Epitaxy analysis
Interface roughness
Phase identification
Phase quantification
Reciprocal space analysis
Residual stress
Texture analysis
Thin film metrology
- Wafer mapping
- 100 mm
- C-to-C wafer loader
- No
- Goniometer configuration
- Horizontal goniometer, Θ-2Θ
- Minimum step size
- 0.0001º
- Tecnologia
-
X-ray Diffraction (XRD)