Overview
Wafer XRD 300 is a high-speed X-ray diffraction system, able to analyze 300mm wafers and provide key data such as crystal orientation, geometric features like diameter or notch position, and much more. It is designed to fit on a wafer-handling front end of your chosen processing step.
Features and Benefits
Ultra-fast and precise: Azimuthal scan method
The azimuthal scan method requires only one measuring rotation to gather all the necessary data to fully determine the orientation, which delivers the results within 10 seconds while not compromising accuracy.
The sample is rotated 360o, with the X-ray source and detector positioned to achieve a certain number of reflections per turn. These reflections enable the orientation of the crystal lattice to be measured in relation to the rotation axis with high precision of up to 0,003o.
Fully automated handling
With measurements completed in just as few as 10 seconds per sample, Wafer XRD 300 allows you to check every wafer that goes through your process, making it a powerful and efficient element in your QC process.
Operating costs are low for the Wafer XRD 300, thanks to its low energy consumption and air-cooled X-ray tube – no water cooling is required.
Easy connectivity
The instrument can be easily integrated into existing processes in production environments using its various MES, SECS/GEM, and similar interfaces.
Deeper insights
Highly accurate in measuring your Si Wafer crystal orientation.
Wafer XRD 300 makes you understand your materials like never before, being able to measure:
- Crystal Orientation
- Notch position, depth, and opening angle
- Diameter
Key Applications
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- Production and processing
- Advancements in automation are changing our industries – and the Wafer XRD 300 is leading the charge as a practical, powerful solution to manage orientation measurements at unprecedented speeds.
- Quality control
- Wafer XRD 300 offers unparalleled efficiency and versatility for production quality control giving you highly accurate results in under 10 seconds.
- It is well-suited for 300mm production enviroments where integration into custom automation is key.
Specification
| Throughput | 10000+ Wafer per Month |
| Wafer geometry | On request |
| Tilt precision | 0.003 |
| XRD axis vs notch / flat position | 0.03° |
Support
Support services
- Phone and remote support
- Preventive maintenance and checkups
- Flexible Customer Care Agreements
- Performance certificates
- Hardware and software upgrades
- Local and global support
Expertise
- Turnkey solutions for elemental and structural semiconductor metrology
- Automation and consultancy
- Training and education
