HTK 16N – high-temperature chamber
For powder XRD in reflection geometry with rapid heating to 1600 ºC.
Complete solution for in situ X-ray analysis
In situ X-ray analysis, often referred to as analysis at non-ambient conditions, is one of the key applications for advanced material research in both academic and industrial environments.
Any macroscopic property of a material is directly related to its structural property (e.g. crystallographic symmetry, crystallite size, vacancies, size and shape of nanoparticles or pores). Temperature, pressure, varying gas atmosphere and mechanical stress trigger phase transformation, chemical reactions, recrystallization and so on.
X-ray diffraction (XRD) and X-ray scattering techniques are the first and sometimes the only choice for the correct and accurate in situ characterization of these changes. Whether it is for optimization of a manufacturing process or tuning of a synthesis procedure, or for state-of-the-art research and creation of new materials, in situ X-ray analysis is the most comprehensive tool for problem solving.
Download the leaflet for an overview of our non ambient attachments and their field of application.
